Dynamics of Epitaxy on Nano-Sized Semiconductor Surfaces

Overview

The document titled "Dynamics of Epitaxy on the Nano-sized Semiconductor Surfaces" is a final technical report authored by Deng-Sung Lin, covering research conducted from March 14, 2005, to September 8, 2006. The report focuses on the study of semiconductor self-assembled quantum dots (QDs), which are nanoscale structures that exhibit unique electronic and photonic properties due to their size-dependent energy levels.

The primary objective of the research is to gain a fundamental understanding of the crystal growth phenomena associated with QDs on patterned semiconductor surfaces, specifically silicon (Si) substrates. The study emphasizes the importance of creating well-defined patterned structures, such as mesas and stripes, with flat (111) sidewalls. This is achieved through lithography and anisotropic wet chemical etching techniques. The report highlights the use of variable-temperature scanning probe microscopy (VT-SPM) to observe the chemical vapor deposition (CVD) growth mechanisms of QDs in real-time, both on the top terraces and sidewalls of these pre-patterned structures.

The document outlines the significance of QDs in semiconductor physics, noting their potential applications in optoelectronic devices due to their high optical efficiency. The research aims to improve the long-range spatial ordering of QDs, which is crucial for enhancing device performance. By selectively growing QDs on finite-sized surfaces, the study seeks to control their position, lateral coupling, and density, which are essential for the development of advanced electronic and optoelectronic applications.

Additionally, the report discusses the differences in epitaxial growth behavior on nanoscale surfaces compared to traditional surfaces, indicating that the unique characteristics of these small structures can lead to more predictable and tunable growth outcomes. The findings from this research are expected to provide valuable insights for researchers working on QD fabrication and contribute to the advancement of device applications in the field of nanotechnology.

The document concludes with a budget section, detailing the financial aspects of the research project, and includes references to previous studies that have laid the groundwork for this investigation. Overall, the report presents a comprehensive overview of the dynamics of epitaxy on nanoscale semiconductor surfaces, emphasizing its relevance to the future of semiconductor technology.